3

Dependency of dishing on polish time and slurry chemistry in Cu CMP

Year:
2000
Language:
english
File:
PDF, 524 KB
english, 2000
15

Analysis of tin dioxide coatings by multiple angle of incidence ellipsometry

Year:
1989
Language:
english
File:
PDF, 111 KB
english, 1989
43

Lightly nitrided gate oxides for 0.25 μm CMOS

Year:
1993
Language:
english
File:
PDF, 356 KB
english, 1993
49

Growth and properties of LPCVD W–Si–N barrier layers

Year:
2001
Language:
english
File:
PDF, 618 KB
english, 2001